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Product Lines: IC, LED, Optoelectronic Process Use Chemicals |
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DONGWOO FINE-CHEM CO.,LTD.
Semiconductor Grade Acid/Solvent(Sulfuric Acid, Hydrogen Peroxide, Chloric Acid, Phosphoric Acid)
Solvent (Methanol, Acetone, IPA)
Stripper |
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SUMITOMO METAL MINING CO.,LTD.
LED Evaporation use ITO targetLED
LED Evaporation use Ag/Pd target |
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San Fu Chemical Co., Ltd.
TMAH 2.38%
TMAH 25%
NMP (N-Methyl-2-Pyrrolidone)
Stripper |
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L.C.Y.C.I.C
ACETONE
IPA |
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PRODUCT ITEMS |
| ELECTRONICS CHEMICALS |
| 品名 |
包裝 |
| AU ETCHANT(金蝕刻液) |
1Gallon/Bottle,20Liter/Drum |
| ACETONE(丙酮) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| AL ETCHANT(鋁蝕刻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| BOE 6:1(氧化物緩衝蝕刻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| Cr ETCHANT(鉻蝕刻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| ETHYLENE GLYCOL(乙二醇) |
1Gallon/Bottle,2.5Gallon/Bottle,25Kg/Drum |
| H2O2(雙氧水) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| H2SO4(硫酸) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| H3PO4(磷酸) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| HCL(鹽酸) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| HF(氫氟酸) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| ITO ETCHANT(銦錫氧化物蝕刻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| IPA(異丙醇) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| I2(碘) |
500g/Bottle,1Kg/Bottle |
| KI(碘化鉀) |
500g/Bottle,1Kg/Bottle |
| KOH(氫氧化鉀) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| METHANOL(甲醇) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| NH4OH(氨水) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| PGMEA(丙二醇甲醚醋酸酯) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
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| LED Evaporation Use Metal |
| 品名 |
包裝 |
| ITO pellet for E-gun |
25mm*10mm, 25mm*15mm |
| ITO pellet for RPD |
30mm*40mm, 20mm*20mm (design by customer request) |
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| Special Chemicals |
| 品名 |
包裝 |
| SAMYANG SLP PR.(LED LIFT OFF PHOTO RESIST) |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
ITO ETCHANT(蝕刻液) |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| AU ETCHANT(蝕刻液） |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| WAX REMOVING(去蠟液) |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| TMAH2.38%(顯影液)、TMAH25% |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| NMP(N-甲基-2-吡咯硐) |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| PMR-300L、400 Stripper(去光阻液) |
4Liter/Bottle,20Liter/200Liter/Drum |
| M15,M16,,M21 Stripper(去光阻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| PMR-610H(Polymer Remover) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
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Resin and Catalyst  |
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 ITI-R02_3mm
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 ITI-R02_6mm
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 ITI-R03_6mm
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 ITI-R05_3mm
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 ITI-R05_6mm
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 ITI-R07_6mm
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 ITI-R08_3mm
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 ITI-R08_6mm
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| Product |
Gas to be treated |
Major target gas |
Process |
| ITI-R01 |
HF,HCl,HBr,Cl2,F2, PFCs |
Cl2,F2 |
Metal Etch, Poly Etch |
| ITI-R02 |
HF,HCl,HBr,Cl2,F2 |
HF,HCl,HBr |
Metal Etch, Poly Etch |
| ITI-R03 |
PH3,AsH3,SiH4 |
PH3,AsH3 |
IMP |
| ITI-R05 |
ClF3,F2,Cl2 |
ClF3,F2,Cl2 |
WCVD, WSix |
| ITI-R06 |
NH3,TDMAT |
NH3 |
MOCVD |
| ITI-R07 |
SiH4,SiCl4,SiF4, SiH2Cl2 |
SiH4,SiCl4,SiF4, SiH2Cl2 |
CVD, EPI |
| ITI-R08 |
HF,HCl,HBr,Cl2,F2,ClF3 |
Cl2,F2,ClF3 |
Metal Etch, Poly Etch |
| ITI-R09 |
HF,HCl,HBr,Cl2,F2,ClF3 |
Cl2,F2,ClF3 |
Metal Etch, Poly Etch |
| ITI-C03 |
CF4,C2F6,C3F8,SF6,NF3 |
PFCs |
Clean gas |
| ITI-C05 |
C3F8, SF6,NF3 |
SF6,NF3 |
Clean gas |
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