 |
产品线：IC、光电半导体制程用化学品
|
| |
 |
东友株式会社
半导体级酸类（硫酸，双氧水，盐酸，磷酸，....）
溶剂（甲醇，丙酮，异丙醇......）
光阻去除剂 |
| |
|
|
| |
 |
SUMITOMO METAL MINING CO.,LTD.
LED蒸镀用ITO靶锭
LED蒸镀用的Ag / Pd靶锭 |
| |
|
|
| |
 |
三福化工股份有限公司
TMAH2.38％（标准显影液）
TMAH25％的浓缩液
的NMP
N-甲基-2 - 比咯举报硐
光阻去除剂 |
| |
|
|
| |
 |
李长荣化学工业股份有限公司
电子级丙酮(ACETONE)
电子级异丙醇(IPA) |
|
 |
 |
 |
|
产品项目 |
| 电子级化学品 |
| 品名 |
包裝 |
| AU ETCHANT(金蚀刻液) |
1Gallon/Bottle,20Liter/Drum |
| ACETONE(丙酮) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| AL ETCHANT(鋁蝕刻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| BOE 6:1(氧化物缓冲蚀刻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| Cr ETCHANT(铝蚀刻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| ETHYLENE GLYCOL(乙二醇) |
1Gallon/Bottle,2.5Gallon/Bottle,25Kg/Drum |
| H2O2(双氧水) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| H2SO4(硫酸) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| H3PO4(磷酸) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| HCL(盐酸) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| HF(氢氟酸) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| ITO ETCHANT(铟锡氧化物蚀刻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| IPA(异丙醇) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| I2(碘) |
500g/Bottle,1Kg/Bottle |
| KI(碘化钾) |
500g/Bottle,1Kg/Bottle |
| KOH(氢氧化钾) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| METHANOL(甲醇) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| NH4OH(氨水) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| PGMEA(丙二醇甲醚醋酸酯) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
|
|
| LED蒸镀用金属 |
| 品名 |
包裝 |
| ITO pellet for E-gun |
25mm*10mm, 25mm*15mm |
| ITO pellet for RPD |
30mm*40mm, 20mm*20mm (design by customer request) |
|
|
| 特用化学品 |
| 品名 |
包裝 |
| SAMYANG SLP PR.(LED LIFT OFF PHOTO RESIST) |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
ITO ETCHANT(蚀刻液) |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| AU ETCHANT(蚀刻液） |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| WAX REMOVING(去蜡液) |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| TMAH2.38%(显影液)、TMAH25% |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| NMP(N-甲基-2- 吡咯硐) |
1Gallon/Bottle,20Liter/Drum,200Liter/Drum |
| PMR-300L、400 Stripper(去光阻液) |
4Liter/Bottle,20Liter/200Liter/Drum |
| M15,M16,,M21 Stripper(去光阻液) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
| PMR-610H(Polymer Remover) |
1Gallon/Bottle,20Liter/Drum,200L/Drum |
|
|
酸性气体及PFC气体吸附材 (Resin and Catalyst)  |
-
 ITI-R02_3mm
-
 ITI-R02_6mm
-
 ITI-R03_6mm
-
 ITI-R05_3mm
-
 ITI-R05_6mm
-
 ITI-R07_6mm
-
 ITI-R08_3mm
-
 ITI-R08_6mm
|
|
|
| Product |
Gas to be treated |
Major target gas |
Process |
| ITI-R01 |
HF,HCl,HBr,Cl2,F2, PFCs |
Cl2,F2 |
Metal Etch, Poly Etch |
| ITI-R02 |
HF,HCl,HBr,Cl2,F2 |
HF,HCl,HBr |
Metal Etch, Poly Etch |
| ITI-R03 |
PH3,AsH3,SiH4 |
PH3,AsH3 |
IMP |
| ITI-R05 |
ClF3,F2,Cl2 |
ClF3,F2,Cl2 |
WCVD, WSix |
| ITI-R06 |
NH3,TDMAT |
NH3 |
MOCVD |
| ITI-R07 |
SiH4,SiCl4,SiF4, SiH2Cl2 |
SiH4,SiCl4,SiF4, SiH2Cl2 |
CVD, EPI |
| ITI-R08 |
HF,HCl,HBr,Cl2,F2,ClF3 |
Cl2,F2,ClF3 |
Metal Etch, Poly Etch |
| ITI-R09 |
HF,HCl,HBr,Cl2,F2,ClF3 |
Cl2,F2,ClF3 |
Metal Etch, Poly Etch |
| ITI-C03 |
CF4,C2F6,C3F8,SF6,NF3 |
PFCs |
Clean gas |
| ITI-C05 |
C3F8, SF6,NF3 |
SF6,NF3 |
Clean gas |
|
|
|
